Epson, a global leader in manufacturing of computer printers, is partnering with select fashion designers across the Americas to add a unique experience to the New York City runway during Fashion Week this February.
Combining fashion and technology, Epson’s Digital Couture event will showcase 11 designers’ collections with Epson’s state-of-the-art sublimation printing to express the freedom and capabilities of technology for the fashion industry.
The featured collections include Ay Not Dead from Argentina, Pilar Briceno from Colombia, Dual from Costa Rica, ESOSA from New York City, Leonor Silva representing the Caribbean (Venezuela to Miami), Ma. Elisa Guillen from Ecuador, Maggie Barry from Los Angeles, Marco Antonio Farias from Chile, Mariana Morrell from Brazil, Moah Saldana from Peru and Pineda Covalin from Mexico.
Agustin Chacon, VP of subsidiary sales and operations for Epson America, Inc., said, “We are excited for today’s fashion designers to bring their creative visions to fabric in new and versatile ways with advanced digital technologies during New York Fashion Week.” He added, “Epson’s dye sublimation printing technology provides another level of creativity and functionality for young fashion entrepreneurs and well established fashion brands looking to produce their art in a more efficient and affordable manner.”
Epson’s advanced printing technologies assist in endless design possibilities across the fashion industry. The end result, Epson said in a press release, is original prints of the highest quality unique to each designer on fabrics that can define their signature style.
The Epson SureColor F-Series dye sublimation printing technology provides access to fashion and textile designers to bring their ideas and inspiration to life in high quality. The high-speed, affordable SureColor F-Series printers produce sharp, vivid images with rich colors, intense blacks, and smooth gradations onto fabric, thus enabling designers to create and print original designs with greater control and flexibility.